Directed self-assembly for nanofabrication and device integration

Linda Yi

(Stanford University)

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Duration: 1h 7m

Date: February 26, 2015


As semiconductor scaling trend continues, directed self-assembly (DSA) provides an inspiring guiding principle and vision for nanofabrication and device integration. For a long time DSA was widely investigated to fabricate periodic and uniform nanostructures over large area. In this talk I will first talk about the flexible control of aperiodic DSA patterns and the application towards next generation lithography. Then I will demonstrate the first 7 nm contact patterning using DSA and a systematic design strategy that links technology node requirements to DSA process and materials. Sub-DSA Resolution Assist Features are also introduced as an effective solution to reduce DSA defectivity. In the last part I will talk about the future of DSA for novel device fabrication.

Created: Monday, March 23rd, 2015